000 01372cam a22003615i 4500
999 _c1962
_d1962
001 19082505
003 OSt
005 20170913092854.0
008 160505s2016 nyu 000 0 eng
010 _a 2016940803
020 _a9789401775953
040 _aDLC
_beng
_cDLC
_erda
_dDLC
042 _apcc
082 _223
_a621.384134
245 0 0 _aVariation-aware advanced CMOS devices and SRAM /
_cChanghwan Shin
263 _a1606
264 1 _aNew York, NY :
_bSpringer Berlin Heidelberg,
_c2016.
300 _avii, 140 p :
_bcol. ill. ;
_c24 cm.
336 _atext
_btxt
_2rdacontent
337 _aunmediated
_bn
_2rdamedia
338 _avolume
_bnc
_2rdacarrier
440 _aSpringer series in advanced microelectronics,
_n56
_94913
504 _aIncludes bibliographical references
650 _aMetal oxide semiconductors, Complementary.
_94914
650 _aRandom access memory.
_94915
856 4 2 _3Contributor biographical information
_uhttps://www.loc.gov/catdir/enhancements/fy1615/2016940803-b.html
856 4 2 _3Publisher description
_uhttps://www.loc.gov/catdir/enhancements/fy1615/2016940803-d.html
856 4 1 _3Table of contents only
_uhttps://www.loc.gov/catdir/enhancements/fy1615/2016940803-t.html
906 _a0
_bibc
_corignew
_d2
_eepcn
_f20
_gy-gencatlg
942 _2ddc
_cBK